wt5 dc magnetron sputtering power for coating machine

US20040149575A1 System for unbalanced magnetron

Another sputter coating method in wide use, especially for deposition of insulative materials at high deposition rates, is reactive sputtering, using two magnetron cathodes coupled by an alternating current (AC) power supply.

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Bjjymd power supply, high voltage, magnetron coating, laser

Bjjymd China supplier of power supply, high voltage, magnetron coating, laser

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One-Way Airport Car Rentals Starting at $9.99 Avis

One-way car rentals are a great taxi alternative. With rates starting at $9.99 you can stop waiting for a taxi and skip the airport parking by using our one-way rentals.

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Flexible Sputter Solutions Ceramic Industry

Home Flexible Sputter Solutions. Flexible Sputter Solutions. December 1, 2008. in AC sputtering). The axial magnetron can be used in DC or in AC at a maximal current of 300 A at 40 kHz. Targets up to 4 m can be applied in a vertical position. AC modules can be used in combination with a standard DC power supply to guarantee a stable

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Sputter Coater brochure NANO-MASTER Catalogue

The RF or DC power is applied to the individual magnetron through an RF switch followed with a manual RF tuner. A manual or stepper motor driven shutter which protects the unused magnetron during sputtering is available as an option. The magnetron and substrate distance is adjustable for adjustment of uniformity or deposition rate.

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Generators for plasma excitation. TRUMPF

Direct current pulsed TruPlasma Highpulse Series 4000 (G2) TruPlasma DC Series 4000 / 4000 (G2) TruPlasma Bias Series 4000 High impulse power DC generators for depositing extremely precise thin film layers. Peak powers of up to 8 megawatts. Designed especially for High Power Impulse Magnetron Sputtering (HIPIMS), they create high plasma densities.

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A versatile coating tool for reactive in-line sputtering

tering system for in-line coating machines that is suited for sputtering in the unipolar as well as in the bipolar pulse mode. In this paper after the description of the system the experimental results obtained using differ-ent pulse modes and pulse parameters will be dis-cussed. 2. Rectangular magnetron sputtering system

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Surface Coatings Technology 2001Peter Frach K Goedicke Chr Gottfried Hagen BartzschCavity magnetron Duty cycle Refractive index Process control Physical vapor dep

Axial Magnetron Soleras Advanced Coatings

DC, pulsed DC and MF switching at medium power levels Can be combined with several components (e.g. magnet bar, elongation parts, sputter electronics, gas distribution and control systems) to obtain accurate process control

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A J A International, Inc. sputtering, sputtering

A J A International, Inc. aja international, inc. designing custom, quality sputtering and thin film deposition equipment since 1988.

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High Vacuum Magnetron Sputter Source 3 inch Providing

Strong coupling with external powerThe SpinTron is equipped with a standard electrical RF connector, which matches physically and electronically with a wide range of DC and RF sputtering power supplies. The low impedance sputtering heads are easily interfacible with an external power supply.

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Protecting lithium metal anode by magnetron sputtering a

The Cu target (purity 99.99%) was deposited by direct current (DC) magnetron sputtering at room temperature. The base pressure of vacuum chamber was 1.0 10 −4 Pa. The working pressure was 1.0 Pa under Ar atmosphere and the power was 30 W. Cu was first pre-sputtered for 10 min and then deposited on the Li substrates for 300 s.

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DC/RF-Magnetron Sputter equipment DLR DLR Portal

Magnetron-Sputtering The magnetron sputtering equipment LA 250S (vonArdenne Anlagentechnik) can be operated with two separate sources at DC or RF power supply. Sputter etching, BIAS voltage, use of three different gases, total pressure measurement and plasma-emission-monitoring are possible.

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Sputtering ThomasNet

High power impulse magnetron sputtering (HiPIMS) services for production of wear resistant and optical coatings. Additional capabilities include physical vapor deposition (PVD), plasma-enhanced chemical vapor deposition (PECVD), plasma spraying, high velocity oxygen fuel (HVOF) coating, and salt bath nitriding.

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HiPIMS Coating System The Tool Coating CemeCon

HiPIMS Coating System perfect machine for the development of custom-built processes. The customer- HIGH POWER IMPULSE MAGNETRON SPUTTERING Cathode BIAS DC Puls DC Intuitive touch control and pneumatic actuators for chamber doors facilitate daily operation of the unit.

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Products NanoTorr High Vacuum Sputtering Deposition System

3-Channel sputtering gases Ar, O 2, and N 2. Operating sputtering pressure range 1 to 50 mTorr in Ar gas. Sputter sources up to eight SpinTron Series high vacuum magnetron sputter sources at customer's choice. Power supplies up to eight power supplies either DC or RF at customer's choice.

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3D Batch Coating Equipment Mustang Vacuum Systems

Power Configurations DC, Pulsed DC, HIPIMS AC, RF PECVD Plasma Enhanced Chemical Vapor Deposition Mustang Vacuum Systems has developed and patented a range of deposition sources only available as part of our complete systems.

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Mantis Deposition Systems HiPIMS

High Power Impulse Magnetron Sputtering (HiPIMS) is a newly developed PVD technology for adhesion enhancement pretreatment and deposition of high density, high performance thin films. It is characterised by a very high pulse power density (up to 3 kWcm-2) at very low duty cycles 5%.

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Dali rf magnetron sputtering low djw vacuum

Our evaporation coating and magnetron coating technology has reached internationally advanced level 3. We have the latest in rf magnetron sputtering technology, including magnetron sputtering machine for ion sputtering production. Our mid-Frequency magnetron coating machine can overcomes striking arc problems well.

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Corona Sputtering For Sale Farm Tractor Parts Equipment

Canon C-7530 Equipment Sputtering Anelva Hf Used Used Sputtering Canon C-7530 Hf Anelva Equipment Varian High Vacuum Sputtering Coating System 3125 S-guns Substrate Planetary . Ae Advanced Energy Mdx 1.5k Magnetron Sputtering Dc Power Supply. 500v 3a .

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Hummer Sputter Systems Anatech USA

Anatech USA sputtering systems are manufactured to meet your specific requirements. Our process, control and system engineers use standard system platforms, add standard or custom modules, depending on your application, your process, and your throughput requirements.

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